A novel noria (water-wheel-like cyclic oligomer) derivative as a chemically amplified electron-beam resist materialKUDO, Hiroto; WATANABE, Daisuke; NISHIKUBO, Tadatomi et al.Journal of material chemistry. 2008, Vol 18, Num 30, pp 3588-3592, issn 0959-9428, 5 p.Article

Development of EUV resist for 22 nm half pitch and beyondNISHINO, Kouta; MARUYAMA, Ken; KIMURA, Tooru et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7969, issn 0277-786X, isbn 978-0-8194-8528-1, 79692I.1-79692I.6, 2Conference Paper

Development of EUV resist for 22 nm half pitch and beyondMARUYAMA, Ken; SHIMIZU, Makoto; HIRAI, Yuuki et al.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7636, issn 0277-786X, isbn 978-0-8194-8050-7 0-8194-8050-9, 76360T.1-76360T.8, 2Conference Paper

Deprotonation mechanism of poly(4-hydroxystyrene) and its derivativeNAKANO, Atsuro; OKAMOTO, Kazumasa; YAMAMOTO, Yukio et al.SPIE proceedings series. 2005, isbn 0-8194-5733-7, 2Vol, Part 2, 1034-1039Conference Paper

Dependence of Acid Generation Efficiency on Acid Molecular Structure and Concentration of Acid Generator in Chemically Amplified EUV ResistHIROSE, Ryo; KOZAWA, Takahiro; TAGAWA, Seiichi et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, pp 69232A.1-69232A.9, issn 0277-786X, isbn 978-0-8194-7108-6Conference Paper

Performance comparison of chemically amplified resists under EUV, EB and KrF exposureSHIMIZU, Daisuke; MATSUMURA, Nobuji; KAI, Toshiyuki et al.Proceedings of SPIE, the International Society for Optical Engineering. 2006, issn 0277-786X, isbn 0-8194-6196-2, 2Vol, Part 2, 615344.1-615344.10Conference Paper

Multicomponent negative-type photoresist based on Noria analog with 12 ethoxy groupsNIINA, Nobumitsu; KUDO, Hiroto; MARUYAMA, Ken et al.Polymer journal. 2011, Vol 43, Num 4, pp 407-413, issn 0032-3896, 7 p.Article

Ultra-thin Film EUV Resists beyond 20nm LithographyNAKAGAWA, Hiroki; FUJISAWA, Tomohisa; GOTO, Kentaro et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7972, issn 0277-786X, isbn 978-0-8194-8531-1, 79721I.1-79721I.7, 2Conference Paper

Characteristics of negative-tone chemically amplified resist (MES-EN1G) for 50keV EB mask writing systemKONDOH, Takehiro; ITOH, Masamitsu; KAI, Toshiyuki et al.SPIE proceedings series. 2002, pp 167-175, isbn 0-8194-4517-7, 9 p.Conference Paper